High contact resistances in atomically thin semiconductors often mask intrinsic electrical transport properties, particularly at low carrier densities where exotic correlated states emerge. We introduce optical voltage profiling, a noninvasive wide-field technique that replaces local voltage probes with a proximal monolayer MoSe₂ exciton sensor. Isolated by thin hexagonal boron nitride, this sensor converts the target's local electrostatic potential into spatially resolved modulations of exciton reflectance. Through pixel-wise in situ calibration, these signals yield quantitative two-dimensional voltage maps of an actively biased semiconductor device. Using this method, we demonstrate the carrier-density-driven metal-insulator transition in bilayer MoSe₂ and obtain channel resistances below 1 kΩ despite MΩ-scale two-terminal resistances in the metallic region. The optically derived resistance exhibits a metal-insulator crossover near the resistance quantum h/e², and the voltage maps and reconstructed local conductivity reveal pronounced spatial heterogeneity in both insulating and metallic regimes. Beyond resolving channel resistance under high contact-resistance conditions, the technique provides spatially resolved access to microscopic transport heterogeneity in functional van der Waals devices.