Color centers in silicon carbide are a promising platform for quantum technologies, offering long-coherence electron and nuclear spins for storing and manipulating quantum information, as well as single-photon emission for quantum communication. Low photon collection efficiency is commonly addressed by integrating color centers into nanophotonic devices. Here, we report a scalable method for the deterministic integration of color centers into silicon carbide nanopillars, using the same nanoscale mask for both implantation of oxygen-related color centers (PL5, PL6) and subsequent nanopillar fabrication via dry etching. This approach solves the issue of low color center creation yield in nanostructures, with figures of merit comparable to bulk samples. We demonstrate count rate enhancements of up to one order of magnitude for PL5 and four times for PL6, while preserving spin coherence times. Our method is directly applicable to other solid-state platforms, offering a scalable route to efficiently integrate color centers into nanostructures.