Combining topological insulators with chiral magnetic multilayers offers the opportunity to greatly enhance the spin-orbit torque (SOT) driven manipulation of hosted spin textures, however this also exposes devices to the often poor temperature stability of the commonly used, Bi₂X₃-based (X is a chalcogenic element), topological insulator films. In this work we demonstrate through in-situ-annealing and polarised neutron reflectometry that the multilayer at a Bi₂Se₃ interface remains magnetically robust up to a temperature of 350 ^∘C: even as the Bi₂Se₃ epilayer structurally deteriorates. Through x-ray photoemission electron microscopy, an intermediate annealing temperature of ∼ 200 ^∘C was found to improve the domain ordering of the multilayer, allowing for field-induced skyrmion nucleation, all whilst sustaining minimal damage to the topological insulator